Published July 1, 2016 | Version v1
Journal article Metadata-only

Magnetron sputtering as a method of thin-film catalyst development for electrochemical sensors

Creators

  • 1. FSUE "SPA"Analitpribor", Smolensk, Babushkin st., 3 (Russian Federation)

Description

The aim of this work was to develop a thin-film Pt/C catalyst on the fluoroplastic substrates by means of the magnetron sputtering method in order to use as reference and working electrodes of electrochemical cells. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/729/1/012007

Additional details

Identifiers

DOI
10.1088/1742-6596/729/1/012007;

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
729
Journal Issue
1
Journal Page Range
[3 p.]
ISSN
1742-6596

Conference

Title
23. international conference on vacuum technique and technology
Dates
7-9 Jun 2016
Place
St Petersburg (Russian Federation)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48100525
Subject category
S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CARBON; CATALYSTS; ELECTROCHEMICAL CELLS; ELECTROCHEMISTRY; ELECTRODES; MAGNETRONS; PLATINUM; SENSORS; SPUTTERING; SUBSTRATES; THIN FILMS
Descriptors DEC
CHEMISTRY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; PLATINUM METALS; TRANSITION ELEMENTS