Published December 23, 2011 | Version v1
Journal article

Excitation Power Dependence Of Photoluminescence From GaAs Quantum Dot Prepared By Droplet Epitaxy Method

  • 1. Department of Nano Systems Engineering, Center for Nano Manufacturing, Inje University, Gimhae (Korea, Republic of)
  • 2. Epi-manufacturing Technology, Samsung LED Co., Ltd., Suwon (Korea, Republic of)
  • 3. Division of Advanced Materials Engineering, Chonbuk National University, Jeonju (Korea, Republic of)
  • 4. Department of Physics, Yeungnam University, Gyeongsan (Korea, Republic of)
  • 5. Department of Visual Optics, Kyungwoon University, Gumi (Korea, Republic of)
  • 6. Advanced Instrument Technology Center, Korea Research Institute of Standards and Science, Daejeon (Korea, Republic of)

Description

GaAs quantum dot (QD) was grown by droplet epitaxy (DE) method and the excitation power dependence of photoluminescence (PL) were carried out. To investigate the effect of annealing temperature on QDs optical properties, the two step RTA process was carried out in a various temperature range from 800 to 1000 deg. C. As the thermal annealing temperature increases, the PL peak position is blue-shifted due to the change of the composition and size distribution of QDs, and the highest PL intensity is observed at the sample annealed at 900 deg. C. The integrated PL intensity (IPL) is plotted against the excitation density in a log-log scale and the slope was calculated.

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1399
Journal Issue
1
Journal Page Range
p. 543-544
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
30. international conference on the physics of semiconductors
Dates
25-30 Jul 2010
Place
Seoul (Korea, Republic of)

Optional Information

Notes
(c) 2011 American Institute of Physics