Published February 26, 2007 | Version v1
Journal article

Characterization of nanostructured Ti-B-(N) coatings produced by direct current magnetron sputtering

  • 1. Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Avda. Americo Vespucio 49, 41092 Sevilla (Spain)
  • 2. Fundacion INASMET, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain)

Description

A series of Ti-B-(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mixtures has been chemically and structurally characterized by transmission electron microscopy, X-ray diffraction, electron energy-loss spectroscopy, and X-ray photoelectron spectroscopy. The influence of synthesis parameters such as applied heating power and nitrogen flow on the structure and chemical composition of the coatings has been studied. Independently of the experimental conditions employed during the synthesis, hexagonal TiB2 is the main crystalline phase present in the coatings. The use of N2 leads to the formation of an amorphous mixture of BN/TiN phases, as well as a diminution of the TiB2 crystalline phase. The influence of the composition and structure of the coatings on their hardness is also discussed

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.11.013;
PII
S0040-6090(06)01332-0;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
7-8
Journal Page Range
p. 3590-3596
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.