Published February 1, 1983
| Version v1
Journal article
Time-resolved x-ray diffraction measurement of the temperature and temperature gradients in silicon during pulsed laser annealing
- 1. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
Description
Nanosecond resolution time-resolved x-ray diffraction measurements have been used to study the temperature and temperature gradients in <100> and <111> oriented silicon crsytals during pulsed laser annealing. Thermal strain analysis of time-resolved extended Bragg scattering has shown the lattice temperature to reach the melting point during 15-ns, 1.5-J/cm2 ruby laser pulses and to remain at the melting point during the high reflectivity phase (HRP). The temperature gradients at the liquid-solid interface were found to be in the range of approx.107 K/cm during the HRP
Additional details
Publishing Information
- Journal Title
- Appl. Phys. Lett.
- Journal Volume
- 42
- Journal Issue
- 3
- Series
- Appl. Phys. Lett.
- Journal Page Range
- 282-284
- ISSN
- 0003-6951
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 14754385
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ANNEALING; BRAGG REFLECTION; CRYSTAL LATTICES; EXPERIMENTAL DATA; INTERFACES; LASER-RADIATION HEATING; LIQUIDS; ORIENTATION; PULSES; REFLECTION; RUBY LASERS; SILICON; SOLIDS; SPATIAL DISTRIBUTION; STRAINS; TEMPERATURE DISTRIBUTION; TEMPERATURE MEASUREMENT; TIME RESOLUTION; X-RAY DIFFRACTION
- Descriptors DEC
- AMPLIFIERS; COHERENT SCATTERING; CRYSTAL STRUCTURE; DATA; DIFFRACTION; DISTRIBUTION; ELEMENTS; EQUIPMENT; FLUIDS; HEAT TREATMENTS; HEATING; INFORMATION; LASERS; NUMERICAL DATA; PLASMA HEATING; RESOLUTION; SCATTERING; SEMIMETALS; SOLID STATE LASERS; TIMING PROPERTIES