Published October 25, 2006 | Version v1
Journal article

Effects of rapid thermal annealing on the optical and electrical properties of InN epilayers

  • 1. Physics Department, Chung Yuan Christian University, Chung-Li, Taiwan (China)
  • 2. Institute of Optoelectronic Sciences, National Taiwan Ocean University, Keelung, Taiwan (China)
  • 3. Department of Physics, National Central University, Chung-Li 320, Taiwan (China)
  • 4. Physics Department, National Taiwan University, Taipei, Taiwan (China)
  • 5. Department of Electronic Engineering, Tung Nan Institute of Technology, Taipei, Taiwan (China)

Description

We studied the optical and electrical properties of InN epilayers with rapid thermal annealing (RTA). The intensity of the photoluminescence (PL) and the carrier mobility were found to increase as the temperature of RTA was increased. We suggest that the formation of compensating acceptors (indium vacancies) after RTA is responsible for the improvement of the quality in InN. The dependence of the PL emission peak on carrier concentration provides a possible method for estimating the carrier concentration in degenerate InN. (letter to the editor)

Availability note (English)

Available online at http://stacks.iop.org/0953-8984/18/L543/cm6_42_L02.pdf or at the Web site for the Journal of Physics. Condensed Matter (ISSN 1361-648X) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Journal of Physics. Condensed Matter
Journal Volume
18
Journal Issue
42
Journal Page Range
p. L543-L549
ISSN
0953-8984
CODEN
JCOMEL