Published September 28, 1998
| Version v1
Journal article
Electron collision frequency in inductively coupled plasmas
Creators
- 1. OSRAM SYLVANIA Development Inc., 71 Cherry Hill Drive, Beverly, Massachusetts 01915 (United States)
Description
no abstract available
Additional details
Identifiers
- DOI
- 10.1063/1.56556;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 443
- Journal Issue
- 1
- Journal Page Range
- p. 365
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- International conference on atomic processes in plasmas
- Dates
- 23-26 Mar 1998
- Place
- Auburn, AL (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40073010
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- COUPLING; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; ELECTRON COLLISIONS; INDUCTION; PLASMA
- Descriptors DEC
- COLLISIONS; ELECTRICAL PROPERTIES; PHYSICAL PROPERTIES
Optional Information
- Notes
- (c) 1998 American Institute of Physics