Published June 6, 2011 | Version v1
Journal article

Reduction in thermal boundary conductance due to proton implantation in silicon and sapphire

  • 1. Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States)
  • 2. Sandia National Laboratories, Albuquerque, New Mexico 87123 (United States)
  • 3. Sandia National Laboratories, Livermore, California 87123 (United States)

Description

We measure the thermal boundary conductance across Al/Si and Al/Al2O3 interfaces that are subjected to varying doses of proton ion implantation with time domain thermoreflectance. The proton irradiation creates a major reduction in the thermal boundary conductance that is much greater than the corresponding decrease in the thermal conductivities of both the Si and Al2O3 substrates into which the ions were implanted. Specifically, the thermal boundary conductances decrease by over an order of magnitude, indicating that proton irradiation presents a unique method to systematically decrease the thermal boundary conductance at solid interfaces.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
98
Journal Issue
23
Journal Page Range
p. 231901-231901.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2011 American Institute of Physics