Published May 31, 2004 | Version v1
Journal article Metadata-only

Plasma irradiation effects in phthalocyanine films

Creators

Description

Plasma irradiation effects in copper phthalocyanine films were examined. The film surface and chemical composition were characterized by means of atomic force microscopy (AFM) and secondary ion mass spectrometry (SIMS), including SIMS profiling

Additional details

Identifiers

DOI
10.1016/j.apsusc.2004.02.043;
PII
S0169433204001758;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
230
Journal Issue
1-4
Journal Page Range
p. 241-248
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38091939
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; CHEMICAL COMPOSITION; COPPER COMPLEXES; ETCHING; FILMS; ION MICROPROBE ANALYSIS; IRRADIATION; MASS SPECTROSCOPY; PHTHALOCYANINES; PLASMA; SURFACES
Descriptors DEC
CHEMICAL ANALYSIS; COMPLEXES; DYES; HETEROCYCLIC COMPOUNDS; MICROANALYSIS; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; ORGANIC COMPOUNDS; SPECTROSCOPY; SURFACE FINISHING; TRANSITION ELEMENT COMPLEXES

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.