Optical properties, crystal structure and micro structure of ZnO:Al thin film on the glass substrate for TCO material

Characterization of optical properties, crystal structure and microstructure of ZnO:Al thin film deposited on glass substrate using DC sputtering method has been done. The aim of this research is to get a ZnO:Al thin film that can be used as a TCO materials for solar cell. The optimum sputtering parameter is obtained at 450°C of substrate temperature, 6x10^-2 Torr of gas pressure and 1,5 hours of time deposition. At this condition the transmittance of ZnO and ZnO:Al thin film at wave length (400 - 800) is (62 - 80) % and (20 - 68) %, respectively. The crystal structure of ZnO and ZnO:Al is oriented at crystal plane (002) with scattering angle 2θ of 34.810° and 34.715°. or on c-axis direction and upright on substrate surface. From microstructure observation using SEM is shown that the grains is distributed homogeneously with the thickness of ZnO and ZnO:Al thin film is about 1.5 μm and 1.0 μm respectively. (author)