Kinetic of electroformation of passive film on zirconium base alloys in halide aqueous solution by means of potentio-dynamic techniques
- 1. Universidad Catolica de Valparaiso, Inst. de Quimica, Valparaiso (Chile)
Description
The potentio-dynamic technique has been used for investigation of the breakdown of the protecting oxide film on the surface of zirconium base alloys, under the influence of halide anions. For chloride and bromide solutions, only slight influence has been shown of these anions on the overall reaction mechanism associated with this process. However, the pitting potential depends on concentration of these anions which implies that they can be occluded during the growth of the oxide film. Two distinguishable contributions are found in iodide solutions. The one at a more negative potential is related with the active dissolution of the alloy, the other, with oxide film electroformation. The absorbability characteristic of I- ions must be considered in formulating an overall reaction mechanism for the passivity of zirconium base alloys
Availability note (English)
MF available from INIS under the Report Number.Files
15024290.pdf
Files
(792.7 kB)
| Name | Size | Download all |
|---|---|---|
|
md5:c578bf9dc51ceacb46dcf78b75728d87
|
792.7 kB | Preview Download |
Additional details
Additional titles
- Subtitle (English)
- Final report for the period 1 December 1981 - 30 November 1983
Publishing Information
- Imprint Pagination
- vp.
- Report number
- IAEA-R--3023-F
INIS
- Country of Publication
- International Atomic Energy Agency (IAEA)
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 15024290
- Subject category
- S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ALLOY-ZR98SN-4; ANIONS; AQUEOUS SOLUTIONS; CHEMICAL REACTION KINETICS; CORROSION; EXPERIMENTAL DATA; HALIDES; POTENTIOMETRY; REDOX POTENTIAL; ZIRCONIUM OXIDES
- Descriptors DEC
- ALLOYS; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL REACTIONS; CHROMIUM ADDITIONS; CORROSION RESISTANT ALLOYS; DATA; DISPERSIONS; HALOGEN COMPOUNDS; HEAT RESISTING ALLOYS; HOMOGENEOUS MIXTURES; INFORMATION; IONS; IRON ADDITIONS; KINETICS; MIXTURES; NUMERICAL DATA; OXIDES; OXYGEN COMPOUNDS; REACTION KINETICS; SOLUTIONS; TIN ALLOYS; TITRATION; TRANSITION ELEMENT COMPOUNDS; ZIRCALOY; ZIRCONIUM ALLOYS; ZIRCONIUM BASE ALLOYS; ZIRCONIUM COMPOUNDS