Published January 2007
| Version v1
Journal article
Room-temperature stimulated emission from ZnO thin films grown by radio-frequency magnetron sputtering
Creators
- 1. Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044 (China)
- 2. Research Institute for Electronic Science, Hokkaido University, Kita-12, Nishi-6, Sapporo 060-0812 (Japan)
Description
ZnO thin films have been deposited by RF-magnetron sputtering on SiO2 substrates. A, B excitons from the absorption spectra at room temperature and A, B and C excitons from the reflectance spectra at the temperature below 166.7 K have been clearly observed. These results indicate that ZnO thin films have a good wurtzite crystal structure. The stimulated emission has been observed at room temperature under various excitation intensities. In the edge emission geometry we determine the gain magnitude with the variable stripe length method. The optical gain is shown as a result of the electron-hole plasma process, and exhibits the highest gain reaching value 270 cm-1 at an excitation density of 1122 kW/cm2
Additional details
Identifiers
- DOI
- 10.1016/j.jlumin.2006.01.299;
- PII
- S0022-2313(06)00303-6;
Publishing Information
- Journal Title
- Journal of Luminescence
- Journal Volume
- 122-123
- Journal Page Range
- p. 825-827
- ISSN
- 0022-2313
- CODEN
- JLUMA8
Conference
- Title
- 2005 International conference on luminescence and optical spectroscopy of condensed matter
- Acronym
- ICL '05
- Dates
- 25-29 Jul 2005
- Place
- Beijing (China)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38037123
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION SPECTRA; CRYSTAL STRUCTURE; EXCITATION; EXCITONS; GAIN; MAGNETRONS; RADIOWAVE RADIATION; SILICA; SILICON OXIDES; SOLID-STATE PLASMA; SPUTTERING; STIMULATED EMISSION; SUBSTRATES; THIN FILMS; ZINC OXIDES
- Descriptors DEC
- AMPLIFICATION; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EMISSION; ENERGY-LEVEL TRANSITIONS; EQUIPMENT; FILMS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PLASMA; QUASI PARTICLES; RADIATIONS; SILICON COMPOUNDS; SPECTRA; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.