Effect of the temperature and UV reflector on the AOP decomposition behavior of the oxalates from the chemical decontamination waste

It is needed to remove remained oxalic acid which chelates with oxidation deposit [2]. In water treatment industry, advanced oxidation processes (AOPs), which decompose organics by forming OH radical from combination of UV, O₃ and H₂O₂, is studied. In previous study, UV/H₂O₂ showed higher efficiency than other AOPs and it was applied easily [3]. In this study, therefore, UV/H₂O₂ process was applied for decomposing remained oxalic acid and effect of temperature and UV reflector, which were selected as influence factors in UV/H₂O₂ process, was estimated. The influence of temperature and UV reflector on the AOP kinetics of the oxalates from the chemical decontamination wastes containing the metallic ions was studied experimentally. We obtained the following conclusion in the experimental ranges: 1. The influence of temperature is considered to be limited, even though increasing temperature results in slight decrease in decomposition rate. 2. The role of the UV reflector is considered as unimportant factor, even though it slightly increases the decomposition rate