Published May 1, 2012 | Version v1
Journal article

Macroscopic parameters of the interaction of an Ar+ ion beam with a Si pitch grating

  • 1. Karazin Kharkiv National University, Faculty of Physics and Technologies, 31 Kurchatov Ave., Kharkiv 61108 (Ukraine)
  • 2. Max-Planck-Institut für Plasmaphysik, EURATOM Association, Wendelsteinstr. 1, 17491 Greifswald (Germany)
  • 3. Max-Planck-Institut für Plasmaphysik, EURATOM Association, Boltzmannstr. 2, 85748 Garching (Germany)
  • 4. Institute of Physics, Ernst-Moritz-Arndt University, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)

Description

A Si pitch grating has been exposed to a 6 keV Ar+ ion beam at normal angle of incidence as well as at angles of 35° both parallel and perpendicular to the structure. Sputtering of the grating has been observed experimentally by Rutherford back-scattering; the bombardment has been simulated by the SDTrimSP-2D code. The numerical simulations show reasonable agreement with experimental results. A pronounced anisotropy effect has been observed comparing the sputtering of the grating parallel and perpendicular to the structure.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2012.01.038

Additional details

Identifiers

DOI
10.1016/j.nimb.2012.01.038;
PII
S0168-583X(12)00061-4;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
278
Journal Page Range
p. 4-7
ISSN
0168-583X
CODEN
NIMBEU

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.