Optimization of synthesis conditions of thin Te-doped InSb films and first principles studies of their physicochemical properties
Creators
- 1. Jagiellonian University, Faculty of Chemistry, Gronostajowa 2, 30-387 Krakow (Poland)
- 2. AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, A. Mickiewicza 30, 30-059 Krakow (Poland)
Description
Highlights: • Composition of In-Sb-Te films can be tuned by electrodeposition conditions. • Te precursor concentration affects the morphology and roughness of deposited films. • InSb and Sb2Te3 phases are formed during co-electrodeposition of In, Sb and Te. • Dopant content influences the optical band gap of Te-doped InSb. The main objective of our study was to develop an electrochemical synthesis method for obtaining Te-doped InSb thin films. The electrodeposition was performed using a pulse mode in a citrate bath containing 0.06 M InCl3, 0.045 M SbCl3 and 0–0.008 M TeO2. Firstly, the optimization of following parameters was carried out: the potential of pulse "off" (Eoff), duration of pulse "off" (toff), and the ratio of time "on" to time "off" (ton/toff). We have confirmed that appropriate selection of electrodeposition conditions allows obtaining a material with a controllable morphology and chemical composition. Based on performed studies, optimal parameters for electrodeposition of thin Te-doped InSb films were selected. In the next stage, the pulse electrodeposition of Te-doped InSb films at previously optimized conditions was conducted from a solution containing different concentrations of the TeO2 precursor. It was demonstrated that adjustment of the TeO2 content in the citrate bath allows controlling the dopant concentration in thin Te-doped InSb films. Such a controllable synthesis creates the opportunity for tuning physicochemical properties of the material. The effect of doping on the crystal structure, phase composition, surface roughness, and optical band gap of thin Te-doped InSb films was discussed in detail.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2020.147715Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2020.147715;
- PII
- S0169433220324727;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 537
- Journal Page Range
- vp.
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54078306
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANTIMONY TELLURIDES; CHEMICAL COMPOSITION; CONCENTRATION RATIO; CRYSTAL STRUCTURE; DOPED MATERIALS; ECOLOGICAL CONCENTRATION; ELECTRODEPOSITION; INDIUM ANTIMONIDES; OPTIMIZATION; SYNTHESIS; TELLURIUM OXIDES; THIN FILMS
- Descriptors DEC
- ANTIMONIDES; ANTIMONY COMPOUNDS; CHALCOGENIDES; DEPOSITION; DIMENSIONLESS NUMBERS; ELECTROLYSIS; FILMS; INDIUM COMPOUNDS; LYSIS; MATERIALS; OXIDES; OXYGEN COMPOUNDS; PNICTIDES; SURFACE COATING; TELLURIDES; TELLURIUM COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2020 Elsevier B.V. All rights reserved.