Czochralski silicon radiation detectors
Creators
- 1. Department of Physics and Astronomy, University of Glasgow, Glasgow G12 8QQ (United Kingdom)
Description
An overview is presented of some of the recent results concerning the suitability of Czochralski silicon to High Energy Physics (HEP) radiation detectors. It has been shown that an elevated oxygen concentration within the bulk silicon of detectors offers increased radiation hardness to charged particle radiation. Silicon produced using the Czochralski growth method has an intrinsically higher concentration of oxygen than the standard silicon growth method, float zone, which is extensively used in HEP radiation detectors. The research reviewed in this paper aims to understand the microscopic and macroscopic behaviour of Czochralski and compares the performance to standard silicon radiation detectors. The majority of this work has been performed in the framework of the RD50 collaboration
Additional details
Identifiers
- DOI
- 10.1016/j.nima.2006.09.016;
- PII
- S0168-9002(06)01598-1;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
- Journal Volume
- 569
- Journal Issue
- 1
- Journal Page Range
- p. 73-76
- ISSN
- 0168-9002
- CODEN
- NIMAER
Conference
- Title
- 14. international workshop on vertex detectors
- Acronym
- VERTEX 2005
- Dates
- 7-11 Nov 2005
- Place
- Nikko, Tochigi (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38038121
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHARGED PARTICLES; DAMAGE; OXYGEN; PERFORMANCE; RADIATION HARDENING; SI SEMICONDUCTOR DETECTORS
- Descriptors DEC
- ELEMENTS; HARDENING; MEASURING INSTRUMENTS; NONMETALS; PHYSICAL RADIATION EFFECTS; RADIATION DETECTORS; RADIATION EFFECTS; SEMICONDUCTOR DETECTORS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.