Published May 1976
| Version v1
Journal article
Production of thin film structures by electron-beam-lithography
Description
The electron-beam-lithography is an important procedure to realize very exact structures in thin films on substrates. A thermal and a nonthermal variant is distinguished. The latter is investigated more in detail. The sequence of the process is described and conclusions derived from this for the technological application are made. (author)
Additional details
Additional titles
- Original title (German)
- Herstellung von Duennschichtstrukturen durch Elektronenstrahllithografie
Publishing Information
- Journal Title
- Feingeraetetechnik (Berlin)
- Journal Volume
- 25
- Journal Issue
- 5
- Series
- Feingeraetetechnik (Berlin).
- Journal Page Range
- 225-226
INIS
- Country of Publication
- German Democratic Republic
- Country of Input or Organization
- German Democratic Republic
- INIS RN
- 8290399
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Descriptors DEI
- ELECTRON BEAMS; INTEGRATED CIRCUITS; LACQUERS; LAYERS; PHOTOSENSITIVITY; REFLECTION; SCATTERING
- Descriptors DEC
- BEAMS; COATINGS; ELECTRONIC CIRCUITS; LEPTON BEAMS; PARTICLE BEAMS; SENSITIVITY