Submicron hollow spot generation by solid immersion lens and structured illumination
Creators
- 1. Optics and Photonics Technology Laboratory, Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue A-L Breguet 2, Neuchâtel CH-2000 (Switzerland)
- 2. Optics Research Group, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft (Netherlands)
- 3. CEA-LETI, Minatec Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)
Description
We report on the experimental and numerical demonstration of immersed submicron-size hollow focused spots, generated by structuring the polarization state of an incident light beam impinging on a micro-size solid immersion lens (μ-SIL) made of SiO2. Such structured focal spots are characterized by a doughnut-shaped intensity distribution, whose central dark region is of great interest for optical trapping of nano-size particles, super-resolution microscopy and lithography. In this work, we have used a high-resolution interference microscopy technique to measure the structured immersed focal spots, whose dimensions were found to be significantly reduced due to the immersion effect of the μ-SIL. In particular, a reduction of 37% of the dark central region was verified. The measurements were compared with a rigorous finite element method model for the μ-SIL, revealing excellent agreement between them. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1367-2630/14/10/103024Additional details
Identifiers
Publishing Information
- Journal Title
- New Journal of Physics
- Journal Volume
- 14
- Journal Issue
- 10
- Journal Page Range
- [19 p.]
- ISSN
- 1367-2630
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44046821
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- BEAMS; DISTRIBUTION; FINITE ELEMENT METHOD; ILLUMINANCE; INTERFERENCE; MICROSCOPY; POLARIZATION; REDUCTION; RESOLUTION; SILICON OXIDES; SOLIDS; VISIBLE RADIATION
- Descriptors DEC
- CALCULATION METHODS; CHALCOGENIDES; CHEMICAL REACTIONS; ELECTROMAGNETIC RADIATION; MATHEMATICAL SOLUTIONS; NUMERICAL SOLUTION; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SILICON COMPOUNDS