Published December 2007 | Version v1
Journal article Metadata-only

Nanocrystalline tetragonal tantalum thin films

Creators

  • 1. Department of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996 (United States)
  • 2. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831 (United States)
  • 3. Department of Materials Science and Engineering, niversity of Tennessee, Knoxville, TN 37996 (United States)

Description

Nanocrystalline tetragonal tantalum thin film was prepared by magnetron sputtering. Structure, electrical and mechanical properties of the film were characterized using X-ray diffraction, transmission electron microscopy, four-point probe and nanoindentation. Electrical resistivity of the film was found to be 264.55 μΩ cm at room temperature with negative temperature dependence. Hardness and Young's modulus of the present tetragonal tantalum thin film with a grain size of 32.3 nm were measured to be 15.0 and 193.9 GPa, respectively

Availability note (English)

Available from http://dx.doi.org/10.1016/j.scriptamat.2007.07.041

Additional details

Identifiers

DOI
10.1016/j.scriptamat.2007.07.041;
PII
S1359-6462(07)00547-7;

Publishing Information

Journal Title
Scripta Materialia
Journal Volume
57
Journal Issue
11
Journal Page Range
p. 1032-1035
ISSN
1359-6462
CODEN
SCMAF7

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39067871
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CRYSTALS; ELECTRIC CONDUCTIVITY; GRAIN SIZE; HARDNESS; MAGNETRONS; NANOSTRUCTURES; PRESSURE RANGE GIGA PA; SPUTTERING; TANTALUM; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; YOUNG MODULUS
Descriptors DEC
COHERENT SCATTERING; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; MECHANICAL PROPERTIES; METALS; MICROSCOPY; MICROSTRUCTURE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PHYSICAL PROPERTIES; PRESSURE RANGE; REFRACTORY METALS; SCATTERING; SIZE; TEMPERATURE RANGE; TRANSITION ELEMENTS

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.