Published June 2002 | Version v1
Journal article

Total-electron-yield X-ray standing-wave measurements of multilayer X-ray mirrors for interface structure evaluation

  • 1. Japan Atomic Energy Research Inst., Mikazuki, Hyogo (Japan). Kansai Research Establishment
  • 2. NTT Advanced Technology Corporation, Tokai, Ibaraki (Japan)
  • 3. Lawrence Berkeley National Laboratory, Center for X-ray Optics, Berkeley, CA (United States)

Description

Total-electron-yield (TEY) X-ray standing-wave measurements of multilayer X-ray mirrors by monitoring sample photocurrent have been performed to obtain information on their layer/interface structure. This simple TEY X-ray standing-wave method enables simultaneous spectral measurement of the X-ray standing-wave and Bragg reflection. From simultaneous measurement of TEY X-ray standing-wave and Bragg reflection spectra of Mo/SiC/Si multilayers, shrinkage of the layer structure was observed along with disordering at the interface by annealing. Mapping measurements of the X-ray standing-wave signals in a Mo/Si multilayer can also be achieved on normal incidence, visibly illustrating the spatial distribution of interface structure in the samples plane. (author)

Additional details

Publishing Information

Journal Title
Japanese Journal of Applied Physics. Part 1, Regular Papers, Short Notes and Review Papers
Journal Volume
41
Journal Issue
6B
Journal Page Range
p. 4250-4252
ISSN
0021-4922

Optional Information

Notes
11 refs., 4 figs.