Published July 15, 2004 | Version v1
Journal article

Si-substitutional defects on the α-Sn/Si(1 1 1)-(√3x√3) surface

Description

We present a theoretical analysis of the atomic and electronic structure of Si-substitutional defects on the α-Sn/Si(1 1 1)-(√3x√3) surface. We use a first-principles DFT local-orbital method and analyze Si-defects on a large Sn/Si(1 1 1) surface unit-cell, corresponding to a defect concentration as low as 3.7%. We also calculate the theoretical STM images, and compare with the experimental results. We find that a single Si-defect induces an upward displacement of its six nearest Sn-adatoms that shows up in filled state STM images as a bright ring of adatoms around the defect. We also analyze the atomic structure and STM images associated with three nearby Si-defects. These results are compared with those found for the Sn/Ge(1 1 1) surface. We conclude that the atomic distortion induced by Si (Ge) substitutional defects is very local, the differences found for these two surfaces being basically due to their different ground state geometries

Additional details

Identifiers

DOI
10.1016/j.apsusc.2004.05.083;
PII
S0169433204007263;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
234
Journal Issue
1-4
Journal Page Range
p. 286-291
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
9. international conference on the formation of semiconductor interfaces
Dates
15-19 Sep 2003
Place
Madrid (Spain)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37093504
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COMPARATIVE EVALUATIONS; CRYSTAL DEFECTS; ELECTRONIC STRUCTURE; GROUND STATES; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACES; TIN
Descriptors DEC
CRYSTAL STRUCTURE; ELEMENTS; ENERGY LEVELS; EVALUATION; METALS; MICROSCOPY; SEMIMETALS

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.