Si-substitutional defects on the α-Sn/Si(1 1 1)-(√3x√3) surface
Description
We present a theoretical analysis of the atomic and electronic structure of Si-substitutional defects on the α-Sn/Si(1 1 1)-(√3x√3) surface. We use a first-principles DFT local-orbital method and analyze Si-defects on a large Sn/Si(1 1 1) surface unit-cell, corresponding to a defect concentration as low as 3.7%. We also calculate the theoretical STM images, and compare with the experimental results. We find that a single Si-defect induces an upward displacement of its six nearest Sn-adatoms that shows up in filled state STM images as a bright ring of adatoms around the defect. We also analyze the atomic structure and STM images associated with three nearby Si-defects. These results are compared with those found for the Sn/Ge(1 1 1) surface. We conclude that the atomic distortion induced by Si (Ge) substitutional defects is very local, the differences found for these two surfaces being basically due to their different ground state geometries
Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2004.05.083;
- PII
- S0169433204007263;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 234
- Journal Issue
- 1-4
- Journal Page Range
- p. 286-291
- ISSN
- 0169-4332
- CODEN
- ASUSEE
Conference
- Title
- 9. international conference on the formation of semiconductor interfaces
- Dates
- 15-19 Sep 2003
- Place
- Madrid (Spain)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37093504
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COMPARATIVE EVALUATIONS; CRYSTAL DEFECTS; ELECTRONIC STRUCTURE; GROUND STATES; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACES; TIN
- Descriptors DEC
- CRYSTAL STRUCTURE; ELEMENTS; ENERGY LEVELS; EVALUATION; METALS; MICROSCOPY; SEMIMETALS
Optional Information
- Copyright
- Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.