Published May 1979
| Version v1
Journal article
Channeling studies of epitaxial uranium dioxide films
Creators
- 1. Japan Atomic Energy Research Inst., Tokai, Ibaraki. Tokai Research Establishment
Description
The authors studied crystalline perfection and He+ ion damage in epitaxial uranium dioxide (UO2) films using a He+ ion backscattering technique. Epitaxial fcc UO2 films were obtained at 3500C on (100) vacuum cleavage faces of rocksalt (NaCl) single crystals. A substantial (100) orientation is found to occur and the film consists of islands connected by rivers. Helium ion channeling studies have been performed using the film exhibiting substantial epitaxy. (Auth.)
Additional details
Publishing Information
- Journal Title
- J. Nucl. Mater.
- Journal Volume
- 80
- Journal Issue
- 2
- Series
- J. Nucl. Mater.
- Journal Page Range
- 386-389
- ISSN
- 0022-3115
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 10483271
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BACKSCATTERING; CATIONS; CRYSTAL STRUCTURE; EPITAXY; FILMS; HELIUM IONS; ION CHANNELING; ORIENTATION; URANIUM DIOXIDE
- Descriptors DEC
- ACTINIDE COMPOUNDS; CHALCOGENIDES; CHANNELING; CHARGED PARTICLES; IONS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; URANIUM COMPOUNDS; URANIUM OXIDES