Published August 21, 2019 | Version v1
Journal article

Control of microstructural phase distribution in Ge2Sb2Te5 phase change memory cells

  • 1. Department of Electrical, Electronic, and Control Engineering, Hankyong National University, Anseong‐si, Gyeonggi‐do (Korea, Republic of)
  • 2. Semiconductor R&D Center, Samsung Electronics Co., Hwaseong‐si, Gyeonggi‐do (Korea, Republic of)

Description

Recently, phase change memory is one of highly developed memory products; however, further research is needed to manage intrinsic variations in switching voltage and resistance drift, which is crucial for high density memory development. Current–voltage characteristics, their temperature dependence, and voltage‐dependent resistance switching characteristics at various programming times are investigated. These data provide an indirect characterization of microstructural phase distribution in the phase change material during memory operations. Subthreshold current–voltage symmetry in phase change memory cells can be used for identifying filamentary or non‐filamentary conducting paths, both of which are controllably formed by adjusting the programming time. This work may contribute to an improved operation method to mitigate intrinsic variations in phase change memories. (© 2019 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Availability note (English)

Available from: http://dx.doi.org/10.1002/pssa.201900196

Additional details

Identifiers

Publishing Information

Journal Title
Physica Status Solidi A. Applications and Materials Science (Online)
Journal Volume
216
Journal Issue
16
Journal Page Range
p. 1-6
ISSN
1862-6319

Optional Information

Notes
AID: 1900196