Published October 1, 2018
| Version v1
Journal article
Effect of charge trap layer thickness on the charge spreading behavior within a few seconds in 3D charge trap flash memory
Creators
- 1. School of Electrical Engineering, Kookmin University, Seoul 02707 (Korea, Republic of)
- 2. Research and Development Division, SK Hynix Semiconductor Inc., Icheon, Gyeongki 17336 (Korea, Republic of)
Description
Charge spreading behavior within a few seconds, referred to as early retention, was comprehensively investigated in 24 word-line stacked tube-type 3D NAND flash memory. We thoroughly explored the charge spreading behavior from the perspectives of both electron and hole spreading in 3D NAND flash memory with different charge trap layer thicknesses at various programming and erasing levels for solid and checkerboard patterns to provide guidelines for minimizing and optimizing the charge spreading. (letter)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6641/aade29Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 33
- Journal Issue
- 10
- Journal Page Range
- [4 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52034540
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRONS; HOLES; LAYERS; OPTIMIZATION; RETENTION; SOLIDS; THICKNESS; THREE-DIMENSIONAL LATTICES; TRAPS
- Descriptors DEC
- CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIMENSIONS; ELEMENTARY PARTICLES; FERMIONS; LEPTONS