Published 2003 | Version v1
Book

A novel electron beam-induced reaction of a sulfonium salt for EB-resist materials

  • 1. Japan Atomic Energy Research Inst., Takasaki, Gunma (Japan). Takasaki Radiation Chemistry Research Establishment

Description

The electron beam (EB)-induced reaction of triphenylsulfonium methanesulfonate (1) in the solid state gave the benzene-substituted product, biphenyldiphenylsulfonium methanesulfonate (2), which has not been observed by either photolysis or EB-induced reaction in a solution. Biphenyl salt 2 was accumulated as an intermediate product at an early stage, and consequently decomposed to diphenylsulfide (3) and three regioisomers of phenylthiobiphenyls (4). A kinetic model of the EB-induced reactions of 1 and 2 revealed that the biphenyl salt 2 exhibited 3.7 times greater kinetic constants for consumption and 6.8 times higher efficiency for acid generation than those of 1. Furthermore, the EB-induced reaction of 1 is comprised of two disparate pathways, one pathway is an unimolecular rearrangement leading to only ortho-isomer of 4 and the other is a bimolecular displacement of phenyl radical leading to 2 and 3. (author)

Part of:
RadTech Asia '03. Proceedings

Additional details

Publishing Information

Publisher
RadTech Asia Organization, RadTech Japan
Imprint Place
Tokyo (Japan)
Imprint Title
RadTech Asia '03. Proceedings
Imprint Pagination
851 p.
Journal Page Range
p. 575-578

Conference

Title
RadTech Asia '03. 9. international conference on radiation curing
Dates
9-12 Dec 2003
Place
Yokohama, Kanagawa (Japan)

Optional Information

Notes
8 refs., 3 figs., 1 tab.