Published July 23, 1990
| Version v1
Journal article
Separation of iron from semiconductor grade silicon in activation analysis
Creators
- 1. Institute of Nuclear Chemistry and Technology, Warsaw (Poland)
Description
A method of separation of iron from silicon for use in the neutron activation analysis was developed. Iron was separated by extraction with N-benzoyl-N-phenylhydroxyl-amine (HBPHA) from 0.4N HCl solution followed by extraction at pH = 3.0. The lower limit of determination was 9.9x10-9 g. (author) 11 refs.; 3 tabs
Additional details
Publishing Information
- Journal Title
- Journal of Radioanalytical and Nuclear Chemistry
- Journal Volume
- 145
- Journal Issue
- 5
- Series
- J. Radioanal. Nucl. Chem. ;Letters.
- Journal Page Range
- 355-360
- ISSN
- 0236-5731
- CODEN
- JRNCD
INIS
- Country of Publication
- Hungary
- Country of Input or Organization
- Hungary
- INIS RN
- 22027877
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- HYDROXYLAMINE; IRON; IRON COMPLEXES; NEUTRON ACTIVATION ANALYSIS; SEMICONDUCTOR MATERIALS; SILICON; SOLVENT EXTRACTION
- Descriptors DEC
- ACTIVATION ANALYSIS; AMINES; CHEMICAL ANALYSIS; COMPLEXES; ELEMENTS; MATERIALS; METALS; NONDESTRUCTIVE ANALYSIS; ORGANIC COMPOUNDS; SEMIMETALS; SEPARATION PROCESSES; TRANSITION ELEMENT COMPLEXES; TRANSITION ELEMENTS