Published 2002
| Version v1
Book
A high sensitive etching set-up
Creators
- 1. Chinese Academy of Sciences, Lanzhou (China). Inst. of Modern Physics
Description
no abstract available
Additional details
Publishing Information
- Publisher
- Atomic Energy Press
- Imprint Place
- Beijing (China)
- ISBN
- 7-5022-2933-7
- Imprint Title
- IMP and HIRFL annual report 2002
- Imprint Pagination
- 173 p.
- Journal Page Range
- p. 112
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 37089442
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- DATA ACQUISITION SYSTEMS; ELECTRIC CURRENTS; EQUIPMENT; ETCHING; HEAVY IONS; IRRADIATION; MEMBRANE PORES; POLYMERS; POWER SUPPLIES; SENSITIVITY; TEMPERATURE CONTROL; XENON IONS
- Descriptors DEC
- CHARGED PARTICLES; CONTROL; CURRENTS; ELECTRONIC EQUIPMENT; EQUIPMENT; IONS; SURFACE FINISHING
Optional Information
- Notes
- 2 figs.