Published May 25, 2009
| Version v1
Journal article
Resistance switching at the Al/SrTiO3-xNy anode interface
- 1. Solid State Chemistry and Catalysis, Empa, Ueberlandstrasse 129, 8600 Duebendorf (Switzerland)
- 2. Paul Scherrer Institut, 5232 Villigen PSI (Switzerland)
Description
The electroformation and resistance switching behavior of Al/SrTiO3-xNy/Al have been investigated. The resistance of Al/SrTiO3-xNy/Al irreversibly increases when voltages higher than a certain threshold voltage are applied. A bistable resistance switching develops at one of the Al electrodes that performs as the anode. The formation of stacking faults in SrTiO3-xNy during preparation by microwave plasma treatment is a prerequisite for the occurrence of switching as confirmed by site-specific high resolution transmission electron microscopy at the electrode interfaces. The resistance switching effect is discussed by considering the role of stacking fault defects in the oxygen/nitrogen diffusion at the anode metal-oxynitride interface.
Additional details
Identifiers
- DOI
- 10.1063/1.3139761;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 94
- Journal Issue
- 21
- Journal Page Range
- p. 212102-212102.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41040166
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM; ANODES; ELECTRIC POTENTIAL; ELECTRODEPOSITION; INTERFACES; MICROWAVE RADIATION; NITRIDES; NITROGEN; OXYGEN; PLASMA; STACKING FAULTS; STRONTIUM TITANATES; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRODES; ELECTROLYSIS; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; LYSIS; METALS; MICROSCOPY; NITROGEN COMPOUNDS; NONMETALS; OXYGEN COMPOUNDS; PNICTIDES; RADIATIONS; STRONTIUM COMPOUNDS; SURFACE COATING; TITANATES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2009 American Institute of Physics