Published January 13, 2014 | Version v1
Journal article

Growth and transport properties of epitaxial lattice matched half Heusler CoTiSb/InAlAs/InP(001) heterostructures

  • 1. Materials Department, University of California, Santa Barbara, California 93106 (United States)
  • 2. Nanometer Structure Consortium (nmC-LU), Department of Physics, Lund University, Lund S-221 00 (Sweden)
  • 3. Department of Electrical and Computer Engineering, University of California, Santa Barbara, California 93106 (United States)

Description

We demonstrate the integration of the lattice matched single crystal epitaxial Half Heusler compound CoTiSb with In0.52Al0.48As/InP(001) heterostructures using molecular beam epitaxy. CoTiSb belongs to the subset of Half Heusler compounds that is expected to be semiconducting, despite being composed entirely of metallic constituents. The lattice matching and epitaxial alignment of the CoTiSb films were confirmed by reflection high energy electron diffraction and X-ray diffraction. Temperature dependent transport measurements indicate semiconducting-like behavior, with a room temperature Hall mobility of 530 cm2/Vs and background Hall carrier density of 9.0 × 1017 cm−3, which is comparable to n-Si with similar carrier density. Below 100 K, the films show a large negative magnetoresistance, and possible origins of this negative magnetoresistance are discussed

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
104
Journal Issue
2
Journal Page Range
p. 022109-022109.5
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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