Published January 2008
| Version v1
Journal article
Electrolytic anodizing of AIIIBV semiconductors implanted with rectifying metals
Creators
- 1. Tekhnologicheskij Inst. Yuzhnogo Federal'nogo Univ., Taganrog (Russian Federation)
- 2. OOO Al'fa, Rostov-na-Donu (Russian Federation)
Description
It is shown that ion implantation of GaAs and GaP semiconductors with Al, Zr, Ta, Hf, Gd and Nb leads to increase of electric strength and decrease of defectiveness of formed anode oxide films. Reactivity relative to hydroxide-ions is found to be decreased in tbe range Hf → Zr → Sc → Y → Ho → Gd → La → Al → Ta → Sb → Si → GaP → InP → Nb → Ga → InSb → In → GaAs → P → InAs → Hf4+ → Zr4+ → Y3+ → Ga3+ → Sc3+ → In3+ → Al3+ → As
Abstract (Russian)
Показано, что ионное легирование арсенида и фосфида галлия Al, Zr, Та, Нf, Gd и Nb позволяет повысить электрическую прочность и уменьшить дефектность формирующихся на поверхности полупроводников анодных оксидных пленок. Установлено, что реакционная способность по отношению к гидроксид-ионам уменьшается в ряду Hf → Zr → Sc → Y → Ho → Gd → La → Al → Ta → Sb → Si → GaP → InP → Nb → Ga → InSb → In → GaAs → P → InAs → Hf4+ → Zr4+ → Y3+ → Ga3+ → Sc3+ → In3+ → Al3+ → AsAdditional details
Additional titles
- Original title (Russian)
- Электролитическое анодирование полупроводников типа А
Publishing Information
- Journal Title
- Fizika i Khimiya Obrabotki Materialov
- Journal Issue
- no.1
- Journal Page Range
- p. 55-59
- ISSN
- 0015-3214
- CODEN
- FKOMAT
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- Russian Federation
- INIS RN
- 40088876
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ACTIVATION ENERGY; ANODIZATION; GADOLINIUM IONS; GALLIUM ARSENIDES; GALLIUM PHOSPHIDES; HAFNIUM IONS; HYDROXIDES; ION IMPLANTATION; NIOBIUM IONS; SEMICONDUCTOR MATERIALS; TANTALUM IONS; THERMODYNAMIC PROPERTIES; ZIRCONIUM IONS
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CHARGED PARTICLES; CHEMICAL COATING; CORROSION PROTECTION; DEPOSITION; ELECTROCHEMICAL COATING; ELECTROLYSIS; ENERGY; GALLIUM COMPOUNDS; HYDROGEN COMPOUNDS; IONS; LYSIS; MATERIALS; OXYGEN COMPOUNDS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; SURFACE COATING
Optional Information
- Notes
- 15 refs., 5 figs., 2 tabs.