Backscattering method possibilities for precise determination of the oxygen profile in oxide films by the use of the elastic resonance in reaction 16O(4He, 4He)16O at 3.045 MeV of 4He

Elastic resonant backscattering can be used as a highly sensitive probe for the measurement of oxygen concentration for different oxides. This method of near-surface analysis is absolute, non-destructive and does not need calibration with the aid of standard samples. Our experimental results concern the investigation of the method possibilities for very precise determination of the concentration profile of oxygen for thin monocrystalline films of high-temperature superconducting materials. An accuracy of better than 1.5 relative per cent (rel.%) for a 30 nm depth resolution and 0.6 rel.% for total oxygen content determination has been reached, which is an uncommon level of precision for the backscattering method. Our results are important for those applications in which oxygen profiling is essential. (author)