Published March 1999
| Version v1
Journal article
Measurement on helium excitation temperature in the vicinity of substrate during helium plasma irradiation
- 1. Hokkaido Univ., Sapporo (Japan). Faculty of Engineering
Description
Excitaion temperature of helium atom in the vicinity of substrate in an ECR helium plasma was measured based on multi-thermal equilibrium (MTE). In the case of no substrate in the plasma, clear atomic line spectra of excited helium were not observed. The intensities of line spectra increased with the negative voltage biased at the substrate and the discharge pressure. The intensities were also strong at the position close to the substrate. From the Boltzmann plot, an excitation temperature of approximately 4000 K for helium atom was obtained. This temperature was a little higher in the case of lower pressure and farther from the substrate. (author)
Additional details
Publishing Information
- Journal Title
- Shinku
- Journal Volume
- 42
- Journal Issue
- 3
- Journal Page Range
- p. 392-395
- ISSN
- 0559-8516
Conference
- Title
- 39. vacuum symposium
- Dates
- 11-13 Nov 1998
- Place
- Osaka (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 30033043
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- EMISSION SPECTRA; EMISSION SPECTROSCOPY; EXCITATION; EXCITED STATES; HELIUM; PLASMA; TEMPERATURE MEASUREMENT; TEMPERATURE RANGE 1000-4000 K; TEMPERATURE RANGE OVER 4000 K; WALL EFFECTS
- Descriptors DEC
- ELEMENTS; ENERGY LEVELS; ENERGY-LEVEL TRANSITIONS; NONMETALS; RARE GASES; SPECTRA; SPECTROSCOPY; TEMPERATURE RANGE