Published March 1999 | Version v1
Journal article

Measurement on helium excitation temperature in the vicinity of substrate during helium plasma irradiation

  • 1. Hokkaido Univ., Sapporo (Japan). Faculty of Engineering

Description

Excitaion temperature of helium atom in the vicinity of substrate in an ECR helium plasma was measured based on multi-thermal equilibrium (MTE). In the case of no substrate in the plasma, clear atomic line spectra of excited helium were not observed. The intensities of line spectra increased with the negative voltage biased at the substrate and the discharge pressure. The intensities were also strong at the position close to the substrate. From the Boltzmann plot, an excitation temperature of approximately 4000 K for helium atom was obtained. This temperature was a little higher in the case of lower pressure and farther from the substrate. (author)

Additional details

Publishing Information

Journal Title
Shinku
Journal Volume
42
Journal Issue
3
Journal Page Range
p. 392-395
ISSN
0559-8516

Conference

Title
39. vacuum symposium
Dates
11-13 Nov 1998
Place
Osaka (Japan)

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
30033043
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
EMISSION SPECTRA; EMISSION SPECTROSCOPY; EXCITATION; EXCITED STATES; HELIUM; PLASMA; TEMPERATURE MEASUREMENT; TEMPERATURE RANGE 1000-4000 K; TEMPERATURE RANGE OVER 4000 K; WALL EFFECTS
Descriptors DEC
ELEMENTS; ENERGY LEVELS; ENERGY-LEVEL TRANSITIONS; NONMETALS; RARE GASES; SPECTRA; SPECTROSCOPY; TEMPERATURE RANGE