Published February 18, 2015
| Version v1
Journal article
A novel method of identifying the carrier transport path in metal oxide resistive random access memory
Creators
- 1. Institute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People's Republic of China (China)
Description
Characterization of defect energy levels is of crucial importance to understand the carrier transport and conduction mechanism of a conducting filament. Currently, it is difficult to probe the defect energy level of a conducting filament in random access memory (RRAM) by experiment. Based on the activation energy of carrier transport from the first-principles calculations, we present a physical model correlating macroscopic I–V characteristics with material microstructure to analyze the defect energy level of a conducting filament in metal oxide RRAM. The carrier transport path in the conducting filament can be specially extracted using the defect energy level. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/48/6/065101Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 48
- Journal Issue
- 6
- Journal Page Range
- [6 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46055648
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ACTIVATION ENERGY; CHARGE CARRIERS; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ENERGY LEVELS; FILAMENTS; METALS; MICROSTRUCTURE; OXIDES; PROBES; RANDOMNESS
- Descriptors DEC
- CHALCOGENIDES; CURRENTS; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES