Published February 18, 2015 | Version v1
Journal article

A novel method of identifying the carrier transport path in metal oxide resistive random access memory

  • 1. Institute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People's Republic of China (China)

Description

Characterization of defect energy levels is of crucial importance to understand the carrier transport and conduction mechanism of a conducting filament. Currently, it is difficult to probe the defect energy level of a conducting filament in random access memory (RRAM) by experiment. Based on the activation energy of carrier transport from the first-principles calculations, we present a physical model correlating macroscopic I–V characteristics with material microstructure to analyze the defect energy level of a conducting filament in metal oxide RRAM. The carrier transport path in the conducting filament can be specially extracted using the defect energy level. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/48/6/065101

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
48
Journal Issue
6
Journal Page Range
[6 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46055648
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ACTIVATION ENERGY; CHARGE CARRIERS; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ENERGY LEVELS; FILAMENTS; METALS; MICROSTRUCTURE; OXIDES; PROBES; RANDOMNESS
Descriptors DEC
CHALCOGENIDES; CURRENTS; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES