The thermal generation of charge carrier in hetero-epitaxy Si-Ge/Si structures with films doped by titanium
Creators
- 1. AS RU, Institute of Ion Plasma and Laser Technologies, Tashkent (Uzbekistan)
Description
The results of observation of the charge carrier generation and the electromotive force appearance on homogeneously heated n-type silicon-germanium films, heavily doped with titanium and grown by deposition from the gas phase on silicon p-type substrates are presented. The maximum value of the electromotive force of 3 mV is recorded in the temperature range 500-600 K at a dark short-circuit current of 0.5-1 μA, the value of which increases with increasing temperature and reaches 3 μA at 900 K. When the contacts are placed on the film and on the substrate, that is when the parameters of the Si-Ge/Si structure proper are measured with its homogeneous heating, the dark current density at 700 K is 2 μA/cm2, and the volume thermoelectric power is 4 mV. (authors)
Additional details
Additional titles
- Original title (Russian)
- Teplovaya generatsiya nositelej toka v geteroehpitaksial'nykh strukturakh Si-Ge/Si s plenkami, legirovannymi titanom
Publishing Information
- Journal Title
- Uzbekiston Fizika Zhurnali
- Journal Volume
- 19
- Journal Issue
- 5
- Journal Page Range
- p. 285-289
- ISSN
- 1025-8817
INIS
- Country of Publication
- Uzbekistan
- Country of Input or Organization
- Uzbekistan
- INIS RN
- 51031822
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHARGE CARRIERS; CURRENT DENSITY; DEPOSITION; DOPED MATERIALS; ELECTROMOTIVE FORCE; EPITAXY; FILMS; GERMANIUM; HEATING; N-TYPE CONDUCTORS; P-TYPE CONDUCTORS; SILICON; SUBSTRATES; TEMPERATURE RANGE 0400-1000 K; TITANIUM
- Descriptors DEC
- CRYSTAL GROWTH METHODS; ELEMENTS; MATERIALS; METALS; SEMICONDUCTOR MATERIALS; SEMIMETALS; TEMPERATURE RANGE; TRANSITION ELEMENTS
Optional Information
- Notes
- 11 refs.