Published March 1983
| Version v1
Journal article
Application of electron beams to lithographic microstructuring in the production of acousto-electronic components
Description
After illustrating operation and structure of microacoustic components electron beam lithographic methods adapted to the production are dealt with. Appropriate electron probes are presented together with their main parameters. The general structural defects resulting from distortion and faulty image composition are discussed and conclusions are drawn with regard to structure design and structure generation
Additional details
Additional titles
- Original title (German)
- Anwendung von Elektronenstrahlen zur lithografischen Mikrostrukturierung bei der Herstellung akustoelektronischer Bauelemente
Publishing Information
- Journal Title
- Elektrie
- Journal Volume
- 37
- Journal Issue
- 3
- Series
- Elektrie.
- Journal Page Range
- 147-149
- ISSN
- 0013-5399
Conference
- Title
- 4. specialists' meeting on electrical technology.
- Dates
- 2-3 Sep 1982.
- Place
- Magdeburg (German Democratic Republic).
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- German Democratic Republic
- INIS RN
- 14779688
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRON BEAMS; ELECTRON PROBES; IMAGES; MICROELECTRONIC CIRCUITS; MICROELECTRONICS; PHYSICAL RADIATION EFFECTS; PIEZOELECTRICITY; SOUND WAVES
- Descriptors DEC
- BEAMS; ELECTRICITY; ELECTRONIC CIRCUITS; LEPTON BEAMS; PARTICLE BEAMS; PROBES; RADIATION EFFECTS