Published 2004 | Version v1
Miscellaneous Metadata-only

Synchrotron imaging for applied and industrial research - Applications in microelectronics and in micro system technology

Creators

  • 1. Fraunhofer Institute for Nondestructive Testing, Dresden (Germany)
  • 2. European Synchrotron Radiation Facility, Grenoble (France)
  • 3. Masaryk University, Brno (Czech Republic)

Description

no abstract available

Part of:
Abstracts of International Conference on Experimental and Computing Methods in High Resolution Diffraction Applied for Structure Characterization of Modern Materials - HREDAMM

Additional details

Publishing Information

Imprint Title
Abstracts of International Conference on Experimental and Computing Methods in High Resolution Diffraction Applied for Structure Characterization of Modern Materials - HREDAMM
Imprint Pagination
98 p.
Journal Page Range
p. 27-28

Conference

Title
International Conference on Experimental and Computing Methods in High Resolution Diffraction Applied for Structure Characterization of Modern Materials - HREDAMM
Dates
13-17 Jun 2004
Place
Zakopane (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
37011097
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
CRYSTAL DEFECTS; CRYSTAL GROWTH; CRYSTAL STRUCTURE; EUROPEAN SYNCHROTRON RADIATION FACILITY; GALLIUM ARSENIDES; GALLIUM NITRIDES; IMAGES; LASER MATERIALS; LAYERS; MATERIALS TESTING; MICROELECTRONICS; STRESSES; THIN FILMS
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL STRUCTURE; FILMS; GALLIUM COMPOUNDS; MATERIALS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; RADIATION SOURCES; SYNCHROTRON RADIATION SOURCES; TESTING

Optional Information