Published July 4, 2016
| Version v1
Journal article
Temperature characteristics of epitaxially grown InAs quantum dot micro-disk lasers on silicon for on-chip light sources
Creators
- 1. Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon (Hong Kong)
- 2. Materials Department, University of California Santa Barbara, Santa Barbara, California 93106 (United States)
- 3. Department of Electrical and Computer Engineering, University of California Santa Barbara, Santa Barbara, California 93106 (United States)
- 4. School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)
Description
Temperature characteristics of optically pumped micro-disk lasers (MDLs) incorporating InAs quantum dot active regions are investigated for on-chip light sources. The InAs quantum dot MDLs were grown on V-groove patterned (001) silicon, fully compatible with the prevailing complementary metal oxide-semiconductor technology. By combining the high-quality whispering gallery modes and 3D confinement of injected carriers in quantum dot micro-disk structures, we achieved lasing operation from 10 K up to room temperature under continuous optical pumping. Temperature dependences of the threshold, lasing wavelength, slope efficiency, and mode linewidth are examined. An excellent characteristic temperature To of 105 K has been extracted.
Additional details
Identifiers
- DOI
- 10.1063/1.4955456;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 109
- Journal Issue
- 1
- Journal Page Range
- vp.
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48035126
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- EPITAXY; INDIUM ARSENIDES; LANTHANUM SELENIDES; LASERS; LIGHT SOURCES; LINE WIDTHS; OPTICAL PUMPING; QUANTUM DOTS; SEMICONDUCTOR MATERIALS; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0013-0065 K; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CHALCOGENIDES; CRYSTAL GROWTH METHODS; INDIUM COMPOUNDS; LANTHANUM COMPOUNDS; MATERIALS; NANOSTRUCTURES; PNICTIDES; PUMPING; RADIATION SOURCES; RARE EARTH COMPOUNDS; SELENIDES; SELENIUM COMPOUNDS; TEMPERATURE RANGE
Optional Information
- Notes
- (c) 2016 Author(s)