Published September 11, 2011 | Version v1
Journal article

Cost effective flip chip assembly and interconnection technologies for large area pixel sensor applications

  • 1. Fraunhofer IZM, Gustav-Meyer-Allee 25, Berlin 13355 (Germany)
  • 2. Berlin Institute of Technology (TUB), Berlin 10623 (Germany)

Description

Much of the cost of manufacturing pixel detectors is due to bumping and flip chip assembly of the readout chips onto sensor tiles, even if it is done on wafer level. To address this issue, Fraunhofer IZM investigated two new technological approaches, namely screen printing using dry film resist and chip-to-wafer assembly. In the first approach, solder bumps with diameters of 80 and 25 μm in pitches of 110 and 60 μm, respectively, were produced by screen-printing solder paste using a photo-structured dry film resist. Results indicated that the technology is a viable high yield and low cost bumping process. The second approach was developed to decrease the number of manual handling steps in pixel module manufacturing, which is critical for reducing processing time and cost. Here, chip designs on 200 mm readout chip (ROC) wafers and 150 mm sensor wafers were especially adapted for chip-to-wafer assembly and to ensure that the interconnection yield and reliability could be tested. After bumping and dicing of the readout chip wafer and UBM plating on the sensor wafer, individual dice were flip chip mounted on the pre-diced sensor wafer. This paper describes the technological steps, key processing parameters and first results for both technologies.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nima.2010.11.089

Additional details

Identifiers

DOI
10.1016/j.nima.2010.11.089;
PII
S0168-9002(10)02624-0;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
650
Journal Issue
1
Journal Page Range
p. 189-193
ISSN
0168-9002
CODEN
NIMAER

Conference

Title
5. international workshop on semiconductor pixel detectors for particles and imaging
Acronym
PIXEL 2010
Dates
6-10 Sep 2010
Place
Grindelwald (Switzerland)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44001682
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BONDING; DESIGN; FILMS; MANUFACTURING; PITCHES; READOUT SYSTEMS; RELIABILITY; SCREEN PRINTING; SENSORS
Descriptors DEC
DEPOSITION; FABRICATION; JOINING; ORGANIC COMPOUNDS; OTHER ORGANIC COMPOUNDS; SURFACE COATING

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.