Cost effective flip chip assembly and interconnection technologies for large area pixel sensor applications
Creators
- 1. Fraunhofer IZM, Gustav-Meyer-Allee 25, Berlin 13355 (Germany)
- 2. Berlin Institute of Technology (TUB), Berlin 10623 (Germany)
Description
Much of the cost of manufacturing pixel detectors is due to bumping and flip chip assembly of the readout chips onto sensor tiles, even if it is done on wafer level. To address this issue, Fraunhofer IZM investigated two new technological approaches, namely screen printing using dry film resist and chip-to-wafer assembly. In the first approach, solder bumps with diameters of 80 and 25 μm in pitches of 110 and 60 μm, respectively, were produced by screen-printing solder paste using a photo-structured dry film resist. Results indicated that the technology is a viable high yield and low cost bumping process. The second approach was developed to decrease the number of manual handling steps in pixel module manufacturing, which is critical for reducing processing time and cost. Here, chip designs on 200 mm readout chip (ROC) wafers and 150 mm sensor wafers were especially adapted for chip-to-wafer assembly and to ensure that the interconnection yield and reliability could be tested. After bumping and dicing of the readout chip wafer and UBM plating on the sensor wafer, individual dice were flip chip mounted on the pre-diced sensor wafer. This paper describes the technological steps, key processing parameters and first results for both technologies.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.nima.2010.11.089Additional details
Identifiers
- DOI
- 10.1016/j.nima.2010.11.089;
- PII
- S0168-9002(10)02624-0;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
- Journal Volume
- 650
- Journal Issue
- 1
- Journal Page Range
- p. 189-193
- ISSN
- 0168-9002
- CODEN
- NIMAER
Conference
- Title
- 5. international workshop on semiconductor pixel detectors for particles and imaging
- Acronym
- PIXEL 2010
- Dates
- 6-10 Sep 2010
- Place
- Grindelwald (Switzerland)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44001682
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BONDING; DESIGN; FILMS; MANUFACTURING; PITCHES; READOUT SYSTEMS; RELIABILITY; SCREEN PRINTING; SENSORS
- Descriptors DEC
- DEPOSITION; FABRICATION; JOINING; ORGANIC COMPOUNDS; OTHER ORGANIC COMPOUNDS; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.