Published October 1, 2007
| Version v1
Journal article
Nanochannels fabricated by high-intensity femtosecond laser pulses on dielectric surfaces
Creators
- 1. Center for Ultrafast Optical Science, Department of Biomedical Engineering, University of Michigan, Michigan 48109 (United States)
- 2. Laboratoire d'Optique Appliquee, ENSTA-Ecole Polytechnique, 91761 Palaiseau Cedex (France)
- 3. P.N. Lebedev Physical Institute, Russian Academy of Sciences, 119991 Moscow (Russian Federation)
Description
Direct scanning electron microscopy examination reveals a complex structure of narrow, micron-deep, internal nanochannels within shallow, nanoscale, external craters fabricated on glass and sapphire surfaces by single high-intensity femtosecond laser pulses, with nearly the same intensity thresholds for both features. Formation of the channels is accompanied by extensive expulsion of molten material produced via surface spallation and phase explosion mechanisms, and redeposited around the corresponding external craters. Potential mechanisms underlying fabrication of the unexpectedly deep channels in dielectrics are considered
Additional details
Identifiers
- DOI
- 10.1063/1.2790741;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 91
- Journal Issue
- 14
- Journal Page Range
- p. 141111-141111.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39035852
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABLATION; DIELECTRIC MATERIALS; GLASS; LASERS; NANOSTRUCTURES; PULSES; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SPALLATION
- Descriptors DEC
- CORUNDUM; ELECTRON MICROSCOPY; MATERIALS; MICROSCOPY; MINERALS; NUCLEAR REACTIONS; OXIDE MINERALS
Optional Information
- Notes
- (c) 2007 American Institute of Physics