Published October 1, 2007 | Version v1
Journal article

Nanochannels fabricated by high-intensity femtosecond laser pulses on dielectric surfaces

  • 1. Center for Ultrafast Optical Science, Department of Biomedical Engineering, University of Michigan, Michigan 48109 (United States)
  • 2. Laboratoire d'Optique Appliquee, ENSTA-Ecole Polytechnique, 91761 Palaiseau Cedex (France)
  • 3. P.N. Lebedev Physical Institute, Russian Academy of Sciences, 119991 Moscow (Russian Federation)

Description

Direct scanning electron microscopy examination reveals a complex structure of narrow, micron-deep, internal nanochannels within shallow, nanoscale, external craters fabricated on glass and sapphire surfaces by single high-intensity femtosecond laser pulses, with nearly the same intensity thresholds for both features. Formation of the channels is accompanied by extensive expulsion of molten material produced via surface spallation and phase explosion mechanisms, and redeposited around the corresponding external craters. Potential mechanisms underlying fabrication of the unexpectedly deep channels in dielectrics are considered

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
91
Journal Issue
14
Journal Page Range
p. 141111-141111.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39035852
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
Descriptors DEI
ABLATION; DIELECTRIC MATERIALS; GLASS; LASERS; NANOSTRUCTURES; PULSES; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SPALLATION
Descriptors DEC
CORUNDUM; ELECTRON MICROSCOPY; MATERIALS; MICROSCOPY; MINERALS; NUCLEAR REACTIONS; OXIDE MINERALS

Optional Information

Notes
(c) 2007 American Institute of Physics