Published March 2007
| Version v1
Journal article
Fabrication of fully epitaxial magnetic tunnel junctions with a Co2MnSi thin film and a MgO tunnel barrier
- 1. Division of Electronics for Informatics, Graduate School of Information Science and Technology, Hokkaido University, N14, W9, Kita-ku, Sapporo 060-0814 (Japan)
Description
Fully epitaxial magnetic tunnel junctions (MTJs) were fabricated with a Co-based full-Heusler alloy Co2MnSi (CMS) thin film having the ordered L21 structure as a lower electrode, a MgO tunnel barrier, and a Co50Fe50 upper electrode. Reflection high-energy electron diffraction patterns observed in situ for each layer in the MTJ layer structure during fabrication clearly indicated that all layers of the CMS lower electrode, MgO tunnel barrier, and Co50Fe50 upper electrode grew epitaxially. The microfabricated fully epitaxial CMS/MgO/Co50Fe50 MTJs demonstrated relatively high tunnel magnetoresistance ratios of 90% at room temperature and 192% at 4.2 K
Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2006.10.919;
- PII
- S0304-8853(06)02141-X;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 310
- Journal Issue
- 2
- Journal Page Range
- p. 2006-2008
- ISSN
- 0304-8853
- CODEN
- JMMMDC
Conference
- Title
- 17. international conference on magnetism
- Dates
- 20-25 Aug 2006
- Place
- Kyoto (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39022208
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COBALT ALLOYS; ELECTRON DIFFRACTION; EPITAXY; FABRICATION; HEUSLER ALLOYS; LAYERS; MAGNESIUM OXIDES; MAGNETORESISTANCE; SILICON ALLOYS; SUPERCONDUCTING JUNCTIONS; TEMPERATURE RANGE 0273-0400 K; THIN FILMS
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; ALLOYS; ALUMINIUM ALLOYS; CHALCOGENIDES; COHERENT SCATTERING; COPPER ALLOYS; COPPER BASE ALLOYS; CORROSION RESISTANT ALLOYS; CRYSTAL GROWTH METHODS; DIFFRACTION; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; FILMS; MAGNESIUM COMPOUNDS; MANGANESE ALLOYS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; TEMPERATURE RANGE; TRANSITION ELEMENT ALLOYS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.