Published February 22, 2006 | Version v1
Journal article

Characterisation of tungsten nano-wires prepared by electron and ion beam induced chemical vapour deposition

  • 1. University of Sheffield, Department of Electronic and Electrical Engineering, Sheffield, S1 3JD (United Kingdom)
  • 2. QinetiQ, St Andrews Road, Malvern, Worcestershire, WR14 3PS (United Kingdom)

Description

In this study we present a morphological characterisation of tungsten nano-wires prepared by electron and ion beam induced chemical vapour deposition. Our observations show that both electron and ion beam as-deposited nano-wires exhibit an amorphous like microstructure. Irradiation of the electron beam deposited wires with 200kV incident electrons in the TEM was found to cause an electron beam induced anneal resulting in the formation of a localised nano-crystalline structure. Wires deposited using 30kV Ga+ ions were found to exhibit the appearance of low temperature superconducting properties with a critical transition temperature Tc of ∼5K

Availability note (English)

Available online at http://stacks.iop.org/1742-6596/26/363/jpconf6_26_088.pdf or at the Web site for the Journal of Physics. Conference Series (Online) (ISSN 1742-6596) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
26
Journal Issue
1
Journal Page Range
p. 363-366
ISSN
1742-6596

Conference

Title
Conference on imaging, analysis and fabrication on the nanoscale
Acronym
EMAG-NANO 2005
Dates
31 Aug - 2 Sep 2005
Place
Leeds (United Kingdom)