Published 1989
| Version v1
Journal article
Thermionic work function of chemically vapor deposited rhenium on tungsten
Creators
- 1. Arizona State Univ., Tempe, AZ (USA). Dept. of Chemical, Bio and Materials Science Engineering
Description
This paper presents an investigation of the vacuum work function of chemically vapor deposited (CVD) rhenium. The thermionic emission technique was used in order to obtain high temperature data. Data were collected as a function of temperature and time, and the total pressure was recorded. X-ray analysis showed that the rhenium was preferentially deposited with the 0001 planes approximately parallel to the emitting surface. The effective work function data were compared with the results of Campbell et al. It is concluded that the residual gas pressure was responsible for conflicting work function data
Additional details
Publishing Information
- Journal Title
- Journal of Materials Engineering
- Journal Volume
- 11
- Journal Issue
- 3
- Series
- J. Mater. Eng.
- Journal Page Range
- 197-200
- ISSN
- 0931-7058
- CODEN
- JMAEE
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 21035178
- Subject category
- S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; DATA PROCESSING; HIGH TEMPERATURE; RHENIUM; SUBSTRATES; TEMPERATURE DEPENDENCE; THERMIONIC EMISSION; TIME DEPENDENCE; TUNGSTEN; X-RAY DIFFRACTION
- Descriptors DEC
- CHEMICAL COATING; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELEMENTS; EMISSION; METALS; SCATTERING; SURFACE COATING; TRANSITION ELEMENTS