Published June 5, 2012 | Version v1
Journal article

Effect of electron beam irradiation on PMMA films

  • 1. Indus Synchrotron Utilization Division, RRCAT, Indore (M.P.), 452013 (India)

Description

Polymethyl methacrylate (PMMA) is characterized for electron beam interactions in the resist layer in lithographic applications. PMMA thin films (free standing) were prepared by solvent casting method. These films were irradiated with 30keV electron beam at different doses. Structural and chemical properties of the films were studied by means of X-ray diffraction and Fourier transform infra-red (FTIR) spectroscopy The XRD results showed that the amorphization increases with electron beam irradiation dose. FTIR spectroscopic analysis reveals that electron beam irradiation promotes the scission of carbonyl group and depletes hydrogen and converts polymeric structure into hydrogen depleted carbon network.

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1447
Journal Issue
1
Journal Page Range
p. 587-588
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
56. DAE solid state physics symposium 2011
Dates
19-23 Dec 2011
Place
Kattankulathur, Tamilnadu (India)

Optional Information

Notes
(c) 2012 American Institute of Physics