Published 1988 | Version v1
Book Metadata-only

Electron-beam, x-ray, and ion-beam technology

Creators

Description

These proceedings collect papers on beam and radiation lithography. Topics include: x-ray lithography, laser-plasma-created x-ray sources, x-ray damage in MOS devices, synchrotron light sources of x-ray lithography, focussed ion-beam microfabrication, and election-beam lithography

Additional details

Publishing Information

Publisher
SPIE Society of Photo-Optical Instrumentation Engineers.
Imprint Place
Bellingham, WA (USA)
Imprint Pagination
308 p.
Series
SPIE - Volume 923.

Conference

Title
submicrometer lithographies VII.
Acronym
Electron beam, x-ray, and ion beam technology
Dates
2-4 Mar 1988.
Place
Santa Clara, CA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
20072146
Subject category
S42: ENGINEERING; S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COATINGS; COMPUTER CODES; COMPUTER-AIDED DESIGN; ETCHING; FABRICATION; LASER RADIATION; X RADIATION; X-RAY SOURCES
Descriptors DEC
ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; RADIATION SOURCES; RADIATIONS

Optional Information

Secondary number(s)
CONF-8803140--.