Published 1982 | Version v1
Report

Fabrication of electron tunneling junctions on Nb3Ge and ErRh4B4 using artificial barriers of rare earth oxides

Description

Electron tunneling junctions have been prepared on Nb3Ge and ErRh4B4 using artificial barriers of thin oxidized films of sputtered rare earth metals. The junction fabrication technique is simple and fast, and has been used to produce Josephson junctions on Nb and ErRh4B4 which have observed to thermally cycle. Although the process was not optimized in the case of Nb3Ge, it showed promise of eliminating the problems that have in the past prevented quantitative tunneling studies of this compound. Single particle and pair tunneling investigations of the re-entrant superconductor ErRh4B4 suggest that a magnetic structure of semi-macroscopic size can coexist with superconductivity at temperatures near the re-entrant transition temperature

Availability note (English)

University Microfilms Order No. 82-21,342.

Additional details

Publishing Information

Imprint Pagination
126 p.

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
15027368
Subject category
S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Thesis, Non-conventional Literature
Descriptors DEI
ERBIUM BORIDES; FABRICATION; GERMANIUM ALLOYS; JOSEPHSON JUNCTIONS; NIOBIUM ALLOYS; RHODIUM BORIDES; SUPERCONDUCTORS; THIN FILMS; TUNNEL EFFECT
Descriptors DEC
ALLOYS; BORIDES; BORON COMPOUNDS; ERBIUM COMPOUNDS; FILMS; RARE EARTH COMPOUNDS; RHODIUM COMPOUNDS; SEMICONDUCTOR JUNCTIONS; TRANSITION ELEMENT COMPOUNDS