Strain-dependent transport properties of the ultra-thin correlated metal, LaNiO3
Creators
- 1. Physics Department, University of Arkansas, Fayetteville, AR 72701 (United States)
- 2. Physikalisches Institut, Universitaet zu Koeln, Zuelpicher Str., 50937 Koeln (Germany)
- 3. Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439 (United States)
Description
We explore the electrical transport and magneto-conductance (MC) in quasi-two-dimensional strongly correlated ultra-thin films of LaNiO3 (LNO) to investigate the effect of hetero-epitaxial strain on electron-electron and electron-lattice interactions from the low to intermediate temperature range (2-170 K). The fully epitaxial 10 unit cell thick films spanning tensile strain up to ∼4% are used to investigate the effects of enhanced carrier localization driven by a combination of weak localization (WL) and electron-electron interactions at low temperatures. The MC data show the importance of the increased contribution of WL to low-temperature quantum corrections. The obtained results demonstrate that with increasing tensile strain and reduced temperature, the quantum-confined LNO system gradually evolves from the Mott into the Mott-Anderson regime.
Availability note (English)
Available from http://dx.doi.org/10.1088/1367-2630/13/7/073037Additional details
Identifiers
Publishing Information
- Journal Title
- New Journal of Physics
- Journal Volume
- 13
- Journal Issue
- 7
- Journal Page Range
- [8 p.]
- ISSN
- 1367-2630
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43028922
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ELECTRON-ELECTRON INTERACTIONS; EPITAXY; PEROVSKITES; STRAINS; THIN FILMS
- Descriptors DEC
- CRYSTAL GROWTH METHODS; FILMS; INTERACTIONS; LEPTON-LEPTON INTERACTIONS; MINERALS; PARTICLE INTERACTIONS