Published July 2011 | Version v1
Journal article

Strain-dependent transport properties of the ultra-thin correlated metal, LaNiO3

  • 1. Physics Department, University of Arkansas, Fayetteville, AR 72701 (United States)
  • 2. Physikalisches Institut, Universitaet zu Koeln, Zuelpicher Str., 50937 Koeln (Germany)
  • 3. Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439 (United States)

Description

We explore the electrical transport and magneto-conductance (MC) in quasi-two-dimensional strongly correlated ultra-thin films of LaNiO3 (LNO) to investigate the effect of hetero-epitaxial strain on electron-electron and electron-lattice interactions from the low to intermediate temperature range (2-170 K). The fully epitaxial 10 unit cell thick films spanning tensile strain up to ∼4% are used to investigate the effects of enhanced carrier localization driven by a combination of weak localization (WL) and electron-electron interactions at low temperatures. The MC data show the importance of the increased contribution of WL to low-temperature quantum corrections. The obtained results demonstrate that with increasing tensile strain and reduced temperature, the quantum-confined LNO system gradually evolves from the Mott into the Mott-Anderson regime.

Availability note (English)

Available from http://dx.doi.org/10.1088/1367-2630/13/7/073037

Additional details

Publishing Information

Journal Title
New Journal of Physics
Journal Volume
13
Journal Issue
7
Journal Page Range
[8 p.]
ISSN
1367-2630

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43028922
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ELECTRON-ELECTRON INTERACTIONS; EPITAXY; PEROVSKITES; STRAINS; THIN FILMS
Descriptors DEC
CRYSTAL GROWTH METHODS; FILMS; INTERACTIONS; LEPTON-LEPTON INTERACTIONS; MINERALS; PARTICLE INTERACTIONS