Published April 5, 1999 | Version v1
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Strain and Texture in Al-Interconnect Wires Measured by X-Ray Microbeam Diffraction

Description

The local strain and texture in Al interconnect wires have been investigated using white and monochromatic x-ray microbeams on the MHATTCAT undulator beam line at the Advanced Photon Source. Intergrain and intragrain orientations were obtained with 0.01 degree sensitivity using white beam measurements on wide Al pads (100 Mu-m) and thin (2 Mu-m) Al wires. Orientation changes of up to 1 degree were found within individual grains of the (111) textured Al interconnects. Deviatoric strain measurements indicate small intragranular strain variations, but intergranular strain variations were found to be quite large

Availability note (English)

Available from INIS in electronic form; ALSO AVAILABLE FROM OSTI AS DE00007925; NTIS; MATERIALS RESEARCH SOCIETY, WARRENDALE, PA; US GOVT. PRINTING OFFICE DEP.

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Additional details

Publishing Information

Imprint Pagination
7 p.
Report number
ORNL/CP--103187

Conference

Title
Materials Research Society Spring Meeting
Dates
5-9 Apr 1999
Place
San Francisco, CA (United States)

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
30048027
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALUMINIUM; CONNECTORS; MEETINGS; STRAINS; TEXTURE; WIRES; X-RAY DIFFRACTION
Descriptors DEC
COHERENT SCATTERING; CONDUCTOR DEVICES; DIFFRACTION; ELECTRICAL EQUIPMENT; ELEMENTS; EQUIPMENT; METALS; SCATTERING

Optional Information

Contract/Grant/Project number
Contract AC05-96OR22464
Notes
KC 02 02 04 0
Funding organization
USDOE Office of Science (United States)