Effect of the scheme of plasmachemical processes on the calculated characteristics of a barrier discharge in xenon
Description
The dynamics of a repetitive barrier discharge in xenon at a pressure of 400 Torr is simulated using a one-dimensional drift-diffusion model. The thicknesses of identical barriers with a dielectric constant of 4 are 2 mm, and the gap length is 4 mm. The discharge is fed with an 8-kV ac voltage at a frequency of 25 or 50 kHz. The development of the ionization wave and the breakdown and afterglow phases of a barrier discharge are analyzed using two different kinetic schemes of elementary processes in a xenon plasma. It is shown that the calculated waveforms of the discharge voltage and current, the instant of breakdown, and the number of breakdowns per voltage half-period depend substantially on the properties of the kinetic scheme of plasmachemical processes.
Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Physics Reports
- Journal Volume
- 34
- Journal Issue
- 6
- Journal Page Range
- p. 452-470
- ISSN
- 1063-780X
- CODEN
- PPHREM
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41127637
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- AFTERGLOW; BREAKDOWN; ELECTRIC DISCHARGES; IONIZATION; ONE-DIMENSIONAL CALCULATIONS; PERMITTIVITY; PLASMA; SIMULATION; WAVE FORMS; XENON
- Descriptors DEC
- DIELECTRIC PROPERTIES; ELECTRICAL PROPERTIES; ELEMENTS; FLUIDS; GASES; NONMETALS; PHYSICAL PROPERTIES; RARE GASES
Optional Information
- Copyright
- Copyright (c) 2008 Pleiades Publishing, Ltd.