Published June 2008 | Version v1
Journal article

Effect of the scheme of plasmachemical processes on the calculated characteristics of a barrier discharge in xenon

  • 1. Kyrgyz-Russian Slavic University (Kyrgyzstan)

Description

The dynamics of a repetitive barrier discharge in xenon at a pressure of 400 Torr is simulated using a one-dimensional drift-diffusion model. The thicknesses of identical barriers with a dielectric constant of 4 are 2 mm, and the gap length is 4 mm. The discharge is fed with an 8-kV ac voltage at a frequency of 25 or 50 kHz. The development of the ionization wave and the breakdown and afterglow phases of a barrier discharge are analyzed using two different kinetic schemes of elementary processes in a xenon plasma. It is shown that the calculated waveforms of the discharge voltage and current, the instant of breakdown, and the number of breakdowns per voltage half-period depend substantially on the properties of the kinetic scheme of plasmachemical processes.

Additional details

Identifiers

Publishing Information

Journal Title
Plasma Physics Reports
Journal Volume
34
Journal Issue
6
Journal Page Range
p. 452-470
ISSN
1063-780X
CODEN
PPHREM

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41127637
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
AFTERGLOW; BREAKDOWN; ELECTRIC DISCHARGES; IONIZATION; ONE-DIMENSIONAL CALCULATIONS; PERMITTIVITY; PLASMA; SIMULATION; WAVE FORMS; XENON
Descriptors DEC
DIELECTRIC PROPERTIES; ELECTRICAL PROPERTIES; ELEMENTS; FLUIDS; GASES; NONMETALS; PHYSICAL PROPERTIES; RARE GASES

Optional Information

Copyright
Copyright (c) 2008 Pleiades Publishing, Ltd.