Published March 15, 2005 | Version v1
Journal article

Effect of the plasma electrode position on the beam intensity and emittance of the RIKEN 18 GHz ECRIS

  • 1. RIKEN, Hirosawa 2-1, Wako, Saitama 351-0198 (Japan)
  • 2. SHI, Accelerator Service Ltd, Kita-shinagawa 5-9-11, Shinjuku-ku, Tokyo 141-0001 (Japan)

Description

We measured the beam intensity of Ar, Kr and Xe ions as a function of plasma electrode position. The beam intensities of lower charge state heavy ions increased when moving the plasma electrode toward the ECR zone. The RF power absorbed in the plasma chamber was slightly dependent on the gas pressure and 70% of injected RF power was absorbed. The emittance of ion source was gradually increased with increasing the drain current, which may be due to the space charge effect

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
749
Journal Issue
1
Journal Page Range
p. 71-74
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
16. international workshop on ECR ion sources
Acronym
ECRIS'04
Dates
26-30 Sep 2004
Place
Berkeley, CA (United States)

Optional Information

Notes
(c) 2005 American Institute of Physics