Structure and electronic properties of transition metal dichalcogenide MX2 (M = Mo, W, Nb; X = S, Se) monolayers with grain boundaries
Creators
- 1. Joint Laboratory of Police Equipment of UESTC, Chengdu, 610054 (China)
- 2. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu, 610054 (China)
- 3. Department of Applied Physics, Hunan University, Changsha, 410082 (China)
- 4. Thin Film Centre, Scottish Universities Physics Alliance (SUPA), University of the West of Scotland, Paisley, PA1 2BE (United Kingdom)
Description
Layered transition metal dichalcogenides with unique mechanical, electronic, optical, and chemical properties can be used for novel nanoelectronic and optoelectronic devices. Large-area monolayers synthesized using chemical vapor deposition are often polycrystals with many dislocations and grain boundaries (GBs). In the present paper, atomic structure and electronic properties of MX2 (M = Mo, W, Nb; X = S, Se) with the GBs were investigated using first principles based on density functional theory. Simulation results revealed that the zigzag-oriented GBs (which consist of pentagon/heptagons (5-7) pairs) were more stable than the armchair-oriented GBs (which consist of pentagon/heptagons (5-7-5-7) pairs). The GBs induced defect levels are located within the band gap for the semiconductor materials of MX2 (M = Mo, W; X = S, Se) monolayers, and the NbS2 and NbSe2 remained as metallic materials with GBs. Results provided a possible pathway to build these nano-layered materials into nanoelectronic devices. - Highlights: • Atomistic structures of GBs in MX2 (M = Mo, W, Nb; X = S, Se) monolayer were identified. • Stability of GBs in the MX2 (M = Mo, W, Nb; X = S, Se) monolayer were studied. • Electronic properties of GBs in the MX2 (M = Mo, W, Nb; X = S, Se) monolayer were studied. • Defect levels induced by the GBs are located within the band gap of semiconducting MX2. • NbS2 and NbSe2 remain as metallic materials within grain boundaries
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matchemphys.2014.06.060Additional details
Identifiers
- DOI
- 10.1016/j.matchemphys.2014.06.060;
- PII
- S0254-0584(14)00411-8;
Publishing Information
- Journal Title
- Materials Chemistry and Physics
- Journal Volume
- 147
- Journal Issue
- 3
- Journal Page Range
- p. 1068-1073
- ISSN
- 0254-0584
- CODEN
- MCHPDR
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46104139
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL PROPERTIES; CHEMICAL VAPOR DEPOSITION; DENSITY FUNCTIONAL METHOD; DISLOCATIONS; ELECTRONIC STRUCTURE; ENERGY GAP; GRAIN BOUNDARIES; LAYERS; MOLYBDENUM SELENIDES; MOLYBDENUM SULFIDES; NANOSTRUCTURES; NIOBIUM SELENIDES; NIOBIUM SULFIDES; POLYCRYSTALS; SEMICONDUCTOR MATERIALS; TUNGSTEN SELENIDES; TUNGSTEN SULFIDES
- Descriptors DEC
- CALCULATION METHODS; CHALCOGENIDES; CHEMICAL COATING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; CRYSTALS; DEPOSITION; LINE DEFECTS; MATERIALS; MICROSTRUCTURE; MOLYBDENUM COMPOUNDS; NIOBIUM COMPOUNDS; REFRACTORY METAL COMPOUNDS; SELENIDES; SELENIUM COMPOUNDS; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS; VARIATIONAL METHODS
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.