Advanced PSII-IM device

A modified PSII device (upgrade of PSII-IM device) has been developed recently for experiments of industrial application at Southwestern Institute of Physics (SWIP). The vacuum chamber is made of stainless steel with 1000 mm diameter and 1070 mm length surrounded by multi-cusp permanent magnets. The device is equipped with a cryogenic pump, an oil diffusion pump and a mechanical pump. The background pressure is less than 2 x 10-4 Pa. The plasma can be generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports. PSII-IBED experiments can be done with the device. The pulsed negative high voltages is 10-90 kV, and the repetition frequency is 50-500 Hz. Generally, plasma density is 108 -1010 cm-3 , film deposition rate is 0.1-1.0 nm/s. Some experimental results are given